| Autor: |
E. Avendaño, A. Azens, G. A. Niklasson, C. G. Granqvist |
| Předmět: |
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| Zdroj: |
Journal of Solid State Electrochemistry; Dec2003, Vol. 8 Issue 1, p37-39, 3p |
| Abstrakt: |
Reactive DC magnetron sputtering was used to grow thin films of Ni (93%)-V (7%) oxide and Ni (62%)-Al (38%) oxide. Both films showed electrochromism in KOH. The addition of Al diminished the luminous absorbance significantly, while the charge capacity was maintained. The Al-containing films are superior to the conventional Ni oxide electrodes as regards applications requiring high-bleached-state transmittance. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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