Investigation into PR profile representation through method of OVL focus subtraction based on a case of Overlay AEI-ADI offset on contact layer of advanced technology node.
| Autor: | Deng, Guogui, Hao, Jingan, Wu, Qiang |
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| Zdroj: | 2016 China Semiconductor Technology International Conference (CSTIC); 2016, p1-5, 5p |
| Databáze: | Complementary Index |
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