A multi-scale simulation method to predict delamination and adhesion force in UV-nanoimprint lithography.
Autor: | Zhong, Yinsheng, Kwok, Stephen. C. T., Yuen, Matthew. M. F. |
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Zdroj: | 2016 17th International Conference on Thermal, Mechanical & Multi-Physics Simulation & Experiments in Microelectronics & Microsystems (EuroSimE); 2016, p1-5, 5p |
Databáze: | Complementary Index |
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