Aluminum induced crystallization of amorphous Ge thin films on insulating substrate.

Autor: Singh, Ch. Kishan, Tah, T., Sunitha, D. T., Polaki, S. R., Madapu, K. K., Ilango, S., Dash, S., Tyagi, A. K.
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Zdroj: AIP Conference Proceedings; 2016, Vol. 1731 Issue 1, p1-3, 3p, 1 Color Photograph, 1 Graph
Abstrakt: Aluminium (metal) induced crystallization of amorphous Ge in bilayer and multilayer Ge/Al thin films deposited on quartz substrate at temperature well below the crystallization temperature of bulk Ge is reported. The crystallization of poly-Ge proceeds via formations of dendritic crystalline Ge grains in the Al matrix. The observed phases were characterized by Raman spectroscopy and X-ray diffraction. The microstructure of Al thin film layer was found to have a profound influence on such crystallization process and formation of dendritic grains. [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index