Alternative integration of ultralow-k dielectrics by template replacement approach.
Autor: | Zhang, L., de Marneffe, J.-F., Heylen, N., Murdoch, G., Tokei, Z., Boemmels, J., De Gendt, S., Baklanov, M. R. |
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Zdroj: | 2015 IEEE International Interconnect Technology Conference & 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM); 2015, p345-348, 4p |
Databáze: | Complementary Index |
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