Alternative integration of ultralow-k dielectrics by template replacement approach.

Autor: Zhang, L., de Marneffe, J.-F., Heylen, N., Murdoch, G., Tokei, Z., Boemmels, J., De Gendt, S., Baklanov, M. R.
Zdroj: 2015 IEEE International Interconnect Technology Conference & 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM); 2015, p345-348, 4p
Databáze: Complementary Index