Preparation and characterization of ultrananocrystalline diamond films in H/Ar/CH gas mixtures system with novel filament structure.

Autor: Feng, Jie, Li, Sha-sha, Luo, Hao, Wei, Qiu-ping, Wang, Bing, Li, Jian-guo, Hu, Dong-ping, Mei, Jun, Yu, Zhi-ming
Zdroj: Journal of Central South University; Nov2015, Vol. 22 Issue 11, p4097-4104, 8p
Abstrakt: Diamond films were prepared by hot filament chemical vapor deposition (HFCVD) in a gas mixtures system of methane, argon and hydrogen. The composition and morphology in different deposition pressures and filament structures were investigated, as well as the friction and wear-resistant properties. The sp-bonded content was measured and nano-mechanics properties were also tested. Results of atomic force microscopy and X-ray photoelectron spectroscopy show that the diamond films whose surface roughness is less than 10 nm and sp-bonded content is greater than 70% can be prepared by bistratal filament structure with optimized proportion of Ar. It is also shown that the friction coefficient of diamond films is 0.13 and its wear-resistant property is excellent. Nano-mechanics of films shows that its elastic modulus is up to 650 MPa and hardness can reach higher than 60 GPa. The diamond films with excellent performance have a broad application prospect in microelectromechanical systems (MEMS). [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index