EUV Research at Berkeley Lab: Enabling Technologies and Applications.
Autor: | Naulleau, Patrick P., Anderson, Christopher N., Chao, Weilun, Fischer, Peter, Goldberg, Kenneth A., Gullikson, Eric M., Miyakawa, Ryan, Kim, Seong-Sue, Lee, Donggun, Park, Jongju |
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Zdroj: | X-Ray Lasers 2014; 2016, p293-300, 8p |
Databáze: | Complementary Index |
Externí odkaz: |