Robust via-programmable ROM design based on 45nm process considering process variation and enhancement Vmin and yield.
| Autor: | Jang, Byung-Jun, Lee, Chan-Ho, Sim, Sung-Hun, Choi, Kyu-Won, Byun, Do-Hun, Jung, Yeon-Ho, Park, Ki-Man, Heo, Dong-Yeon, Kim, Gyu-Hong, Yang, Joon-Sung |
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| Zdroj: | 2015 IEEE International Symposium on Circuits & Systems (ISCAS); 2015, p2541-2544, 4p |
| Databáze: | Complementary Index |
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