Effect of top corner rounding in BEOL to yield in advanced technologies.
| Autor: | Ramanathan, Eswar, Silvestre, Mary Claire, Mahalingam, Anbu Selvam KM, Garg, Niti, Siddhartha, Ordonio, Christopher, Schaller, John |
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| Zdroj: | 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2015, p68-71, 4p |
| Databáze: | Complementary Index |
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