Vertical natural capacitor time dependent dielectric breakdown (TDDB) improvement in 28nm.
| Autor: | Silvestre, Mary Claire, Wenyi, Zhang Galor, Selvam, KM Mahalingam Anbu, Ramanathan, Eswar, Ordonio, Christopher, Schaller, John, Hyup, Lee Jong, Capasso, Cristiano, Justison, Patrick |
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| Zdroj: | 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2015, p411-415, 5p |
| Databáze: | Complementary Index |
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