Evaluation of plasma process damage during TSV formation and damage reduction method.

Autor: Igarashi, Takatoshi, Kojima, Kazuaki, Matsumoto, Kazuya, Fujimori, Noriyuki, Nakamura, Tsutomu
Zdroj: 2015 International Conference on Electronic Packaging & iMAPS All Asia Conference (ICEP-IAAC); 2015, p74-77, 4p
Databáze: Complementary Index