Measurement of Vth variation due to STI stress and inverse narrow channel effect at ultra-low voltage in a variability-suppressed process.
| Autor: | Ogasahara, Yasuhiro, Hioki, Masakazu, Nakagawa, Tadashi, Sekigawa, Toshihiro, Tsutsumi, Toshiyuki, Koike, Hanpei |
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| Zdroj: | Proceedings of the 2015 International Conference on Microelectronic Test Structures; 2015, p126-130, 5p |
| Databáze: | Complementary Index |
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