Sub-22nm scaling of UTB2SOI devices for Multi-Vt applications.
Autor: | Diaz-Llorente, C., Medina-Bailon, C., Sampedro, C., Gamiz, F., Godoy, A., Donetti, L. |
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Zdroj: | EUROSOI-ULIS 2015: 2015 Joint International EUROSOI Workshop & International Conference on Ultimate Integration on Silicon; 2015, p281-284, 4p |
Databáze: | Complementary Index |
Externí odkaz: |