Constrained pattern assignment for standard cell based triple patterning lithography.

Autor:	Tian, Haitong, Du, Yuelin, Zhang, Hongbo, Xiao, Zigang, Wong, Martin D. F.
Zdroj:	Proceedings of the International Conference Computer-aided Design; 11/18/2013, p178-185, 8p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu