Surface pretreatment and passivation utilizing high concetrated HCL and NH4F solution for germanium-based technology.
| Autor: | Xia, Yuxuan, Zhang, Bingxin, Li, Min, Lin, Meng, Liu, Pengqiang, Zhao, Yang, Li, Ming, An, Xia, Zhang, Xing, Huang, Ru |
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| Zdroj: | 2014 12th IEEE International Conference on Solid-State & Integrated Circuit Technology (ICSICT); 2014, p1-3, 3p |
| Databáze: | Complementary Index |
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