Development of the post-chemical mechanical polishing cleaner suppressing galvanic corrosion between copper and the Co barrier metal.
| Autor: | Kusano, Tomohiro, Shibata, Toshiaki, Itou, Atsushi, Mizutani, Fumikazu |
|---|---|
| Zdroj: | Proceedings of International Conference on Planarization/CMP Technology 2014; 2014, p133-136, 4p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|