Thermomechanical stress analysis of copper/silicon interface in through silicon vias using FEM simulations and experimental analysis.

Autor: Remili, Z., Ousten, Y., Levrier, B., Mercier, D., Suhir, E., Bechou, L.
Zdroj: Proceedings of the 5th Electronics System-integration Technology Conference (ESTC); 2014, p1-6, 6p
Databáze: Complementary Index