| Autor: |
Hiroko Murayama, Tatsushi Ohyama, Akira Terakawa, Hideyuki Takagishi, Takashi Masuda, Keisuke Ohdaira, Tatsuya Shimoda |
| Zdroj: |
Japanese Journal of Applied Physics; May2014, Vol. 53 Issue 5S1, p1-1, 1p |
| Abstrakt: |
The film property distributions along the thickness direction of the catalyst-generated atomic hydrogen (Cat-H*) treatment effects on hydrogenated amorphous silicon (a-Si:H) fabricated by plasma-enhanced chemical vapor deposition (plasma-CVD) and Liquid-Si printing (LSP) were systematically investigated. The a-Si:H films fabricated by LSP (L-a-Si:H) had nanosize voids; however, these films showed a decrease in void size around the surface region after Cat-H* treatment, in contrast to stable plasma-CVD films without voids. The decrease in nonaffected area by Cat-H* treatment in L-a-Si:H films improved the performance of a-Si:H solar cells with L-a-Si:H. Additionally, we achieved a 3.1% conversion efficiency for a-Si:H solar cells with L-a-Si:H as the active layer by stacking nondoped a-Si:H, fabricated by plasma-CVD, on the active layer. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
|
