E-beam fluorinated CVD graphene: in-situ XPS study on stability and NH 3 adsorption doping effect.
| Autor: | Malesys V; Institut de Sciences des Matériaux de Mulhouse, Université de Haute Alsace CNRS-UMR 7361, Mulhouse, France., Duan T; Department of Engineering Sciences, Ångström Laboratory, Uppsala University, 75121 Uppsala, Sweden., Denys E; Institut de Sciences des Matériaux de Mulhouse, Université de Haute Alsace CNRS-UMR 7361, Mulhouse, France., Li H; Department of Engineering Sciences, Ångström Laboratory, Uppsala University, 75121 Uppsala, Sweden.; Shandong Technology Centre of Nanodevices and Integration, School of Microelectronics, Shandong University, Jinan 250101, People's Republic of China., Leifer K; Department of Engineering Sciences, Ångström Laboratory, Uppsala University, 75121 Uppsala, Sweden., Simon L; Institut de Sciences des Matériaux de Mulhouse, Université de Haute Alsace CNRS-UMR 7361, Mulhouse, France. |
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| Jazyk: | angličtina |
| Zdroj: | Nanotechnology [Nanotechnology] 2024 Dec 19; Vol. 36 (9). Date of Electronic Publication: 2024 Dec 19. |
| DOI: | 10.1088/1361-6528/ad9ab0 |
| Abstrakt: | Graphene exhibits promise in gas detection applications despite its limited selectivity. Functionalization with fluorine atoms offers a potential solution to enhance selectivity, particularly towards ammonia (NH+) molecules. This article presents a study on electron-beam fluorinated graphene (FG) and its integration into gas sensor platforms. We begin by characterizing the thermal stability of fluorographene, demonstrating its resilience up to 450 °C. Subsequently, we investigate the nature of NH (© 2024 IOP Publishing Ltd. All rights, including for text and data mining, AI training, and similar technologies, are reserved.) |
| Databáze: | MEDLINE |
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