Thin Film Formation Based on a Nanoporous Metal-Organic Framework by Layer-By-Layer Deposition.
Autor: | Fratschko M; Institute of Solid State Physics, Graz University of Technology, Graz 8010, Austria., Zhao T; Institute of Microstructure Technology, Karlsruhe Institute of Technology, Karlsruhe 76131, Germany., Fischer JC; Institute of Microstructure Technology, Karlsruhe Institute of Technology, Karlsruhe 76131, Germany., Werzer O; Department Materials, Joanneum Research Forschungsgesellschaft mbH, Weiz 8160, Austria., Gasser F; Institute of Solid State Physics, Graz University of Technology, Graz 8010, Austria., Howard IA; Institute of Microstructure Technology, Karlsruhe Institute of Technology, Karlsruhe 76131, Germany., Resel R; Institute of Solid State Physics, Graz University of Technology, Graz 8010, Austria. |
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Jazyk: | angličtina |
Zdroj: | ACS applied nano materials [ACS Appl Nano Mater] 2024 Nov 01; Vol. 7 (22), pp. 25645-25654. Date of Electronic Publication: 2024 Nov 01 (Print Publication: 2024). |
DOI: | 10.1021/acsanm.4c04763 |
Abstrakt: | Understanding the structure of thin films is essential for successful applications of metal-organic frameworks (MOFs), such as low k-dielectrics in electronic devices. This study focuses on the thin film formation of the 3D nanoporous MOF Cu Competing Interests: The authors declare no competing financial interest. (© 2024 The Authors. Published by American Chemical Society.) |
Databáze: | MEDLINE |
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