Stabilizing Metal Halide Perovskite Films via Chemical Vapor Deposition and Cryogenic Electron Beam Patterning.
Autor: | Burns R; Department of Physics and Astronomy, University of Missouri, Columbia, MO, 65211, USA., Chiaro D; Department of Physics and Astronomy, University of Missouri, Columbia, MO, 65211, USA., Davison H; Department of Physics and Astronomy, University of Missouri, Columbia, MO, 65211, USA., Arendse CJ; Department of Physics and Astronomy, Nano-Micro Manufacturing Facility, University of the Western Cape, Bellville, 7535, South Africa., King GM; Department of Physics and Astronomy, Department of Biochemistry, and MU Materials Science and Engineering Institute, University of Missouri, Columbia, MO, 65211, USA., Guha S; Department of Physics and Astronomy and MU Materials Science and Engineering Institute, University of Missouri, Columbia, MO, 65211, USA. |
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Jazyk: | angličtina |
Zdroj: | Small (Weinheim an der Bergstrasse, Germany) [Small] 2024 Nov 13, pp. e2406815. Date of Electronic Publication: 2024 Nov 13. |
DOI: | 10.1002/smll.202406815 |
Abstrakt: | Halide perovskites are hailed as semiconductors of the 21 st century. Chemical vapor deposition (CVD), a solvent-free method, allows versatility in the growth of thin films of 3- and 2D organic-inorganic halide perovskites. Using CVD grown methylammonium lead iodide (MAPbI (© 2024 Wiley‐VCH GmbH.) |
Databáze: | MEDLINE |
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