The E × B magnetized plasma device (EMPD).

Autor: Hooper CT; Assurance Technology Corporation, Carlisle, Massachusetts 01741, USA.; Department of Electrical and Computer Engineering, University of New Mexico, Albuquerque, New Mexico 87131, USA., Smith JR; Department of Nuclear Engineering and Radiological Sciences, University of Michigan, Ann Arbor, Michigan 48109, USA., Brewer TR; Kevin T. Crofton Department of Aerospace and Ocean Engineering, Virginia Polytechnic Institute and State University, Blacksburg, Virginia 24061, USA., Heinrich JR; Lockheed Martin, St. Paul, Minnesota 55121, USA., Reid R; Air Force RDHP, Air Force Research Laboratory, Albuquerque, New Mexico 87108, USA., Cooke DL; Space Force RVBX, Air Force Research Laboratory, Albuquerque, New Mexico 87108, USA.
Jazyk: angličtina
Zdroj: The Review of scientific instruments [Rev Sci Instrum] 2024 Sep 01; Vol. 95 (9).
DOI: 10.1063/5.0188913
Abstrakt: A plasma device has been created to study dynamic plasma coupling in an E × B-drifting magnetized plasma. The E × B magnetized plasma device is a 1.2 m diameter by 2 m long cylindrical chamber with two sets of Helmholtz coils in a mirror configuration. A steady-state axial hollow cathode source injects a plasma discharge in electrical contact with a floating conductor at a range that forms a unique axisymmetric equipotential surface or Virtual Cathode Lightsaber (VCL). The VCL generates two plasma populations streaming relative to one another providing a suitable environment for the investigation of dynamic plasma coupling. The plasma density, radial electric field, and plasma rotational velocity outside the VCL are shown to be influenced by the current-voltage relationship of the cathode and applied magnetic field strength. A basic characterization of the device and plasma environment is presented with an emphasis on diagnostics systems and the analytical techniques utilized.
(© 2024 Author(s). Published under an exclusive license by AIP Publishing.)
Databáze: MEDLINE
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