Interface-Engineered Atomic Layer Deposition of 3D Li 4 Ti 5 O 12 for High-Capacity Lithium-Ion 3D Thin-Film Batteries.

Autor: Speulmanns J; Center Nanoelectronic Technologies, Fraunhofer Institute for Photonic Microsystems, An der Bartlake 5, 01109, Dresden, Germany.; Department of Chemistry, Humboldt-University Berlin, Brook-Taylor-Strasse 2, 12489, Berlin, Germany., Bönhardt S; Center Nanoelectronic Technologies, Fraunhofer Institute for Photonic Microsystems, An der Bartlake 5, 01109, Dresden, Germany., Weinreich W; Center Nanoelectronic Technologies, Fraunhofer Institute for Photonic Microsystems, An der Bartlake 5, 01109, Dresden, Germany., Adelhelm P; Department of Chemistry, Humboldt-University Berlin, Brook-Taylor-Strasse 2, 12489, Berlin, Germany.; Joint research group Operando Battery Analysis (CE-GOBA), Helmholtz-Zentrum Berlin für Materialien und Energie, Hahn-Meitner-Platz 1, 14109, Berlin, Germany.
Jazyk: angličtina
Zdroj: Small (Weinheim an der Bergstrasse, Germany) [Small] 2024 Oct; Vol. 20 (42), pp. e2403453. Date of Electronic Publication: 2024 Jun 08.
DOI: 10.1002/smll.202403453
Abstrakt: Upcoming energy-autonomous mm-scale Internet-of-things devices require high-energy and high-power microbatteries. On-chip 3D thin-film batteries (TFBs) are the most promising option but lack high-rate anode materials. Here, Li 4 Ti 5 O 12 thin films fabricated by atomic layer deposition (ALD) are electrochemically evaluated on 3D substrates for the first time. The 3D Li 4 Ti 5 O 12 reveals an excellent footprint capacity of 20.23 µAh cm -2 at 1 C. The outstanding high-rate capability is demonstrated with 7.75 µAh cm -2 at 5 mA cm -2 (250 C) while preserving a remarkable capacity retention of 97.4% after 500 cycles. Planar films with various thicknesses exhibit electrochemical nanoscale effects and are tuned to maximize performance. The developed ALD process enables conformal high-quality spinel (111)-textured Li 4 Ti 5 O 12 films on Si substrates with an area enhancement of 9. Interface engineering by employing ultrathin AlO x on the current collector facilitates a required crystallization time reduction which ensures high film and interface quality and prospective on-chip integration. This work demonstrates that 3D Li 4 Ti 5 O 12 by ALD can be an attractive solution for the microelectronics-compatible fabrication of scalable high-energy and high-power Li-ion 3D TFBs.
(© 2024 The Author(s). Small published by Wiley‐VCH GmbH.)
Databáze: MEDLINE
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