Transparent Conductive Titanium and Fluorine Co-doped Zinc Oxide Films.

Autor: Ramzan I; Materials Chemistry Centre, Department of Chemistry, University College London, London, WC1H 0AJ, UK., Borowiec J; Materials Chemistry Centre, Department of Chemistry, University College London, London, WC1H 0AJ, UK., Parkin IP; Materials Chemistry Centre, Department of Chemistry, University College London, London, WC1H 0AJ, UK., Carmalt CJ; Materials Chemistry Centre, Department of Chemistry, University College London, London, WC1H 0AJ, UK.
Jazyk: angličtina
Zdroj: ChemPlusChem [Chempluschem] 2024 Aug; Vol. 89 (8), pp. e202400073. Date of Electronic Publication: 2024 May 08.
DOI: 10.1002/cplu.202400073
Abstrakt: Aerosol-assisted chemical vapor deposition (AACVD) was used to deposit highly transparent and conductive titanium or fluorine-doped and titanium-fluorine co-doped ZnO thin films on glass substrate at 450 °C. All films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), UV-Vis spectroscopy, scanning electron spectroscopy (SEM), and four-point probe. The films were 600-680 nm thick, crystalline, and highly transparent (80-87 %). The co-doped film consisted of 0.70 at % titanium and 1 at % fluorine, and displayed a charger carrier mobility, charge carrier concentration, and a minimum resistivity of 8.4 cm 2  V -1  s -1 , 3.97×10 20  cm -3 , and 1.69×10 -3  Ω cm, respectively. A band gap of 3.6 eV was observed for the co-doped film. Compared to the undoped and singly doped films, the co-doped film displayed a notably higher structure morphology (more homogenous grains with well-defined boundaries) suitable for transparent conducting oxide applications.
(© 2024 The Authors. ChemPlusChem published by Wiley-VCH GmbH.)
Databáze: MEDLINE