| Autor: |
Mei H; Guangdong Provincial Key Laboratory of Electronic Functional Materials and Devices, Huizhou University, Huizhou 516007, China., Lin C; Guangdong Provincial Key Laboratory of Electronic Functional Materials and Devices, Huizhou University, Huizhou 516007, China., Li Y; Guangdong Provincial Key Laboratory of Electronic Functional Materials and Devices, Huizhou University, Huizhou 516007, China., Shen Y; Guangdong Provincial Key Laboratory of Electronic Functional Materials and Devices, Huizhou University, Huizhou 516007, China., Li Q; Guangdong Provincial Key Laboratory of Electronic Functional Materials and Devices, Huizhou University, Huizhou 516007, China., Wang R; School of Mechanical Engineering, Guilin University of Aerospace Technology, Guilin 541004, China., Zeng W; Hunan Yongshan Lithium Industry Co., Ltd., Ningxiang 410203, China., Mei W; Shenzhen Qiling Image Technology Co., Ltd., Shenzhen 518000, China., Gong W; Guangdong Provincial Key Laboratory of Electronic Functional Materials and Devices, Huizhou University, Huizhou 516007, China. |
| Abstrakt: |
To improve the gas ionization ratio, the Mo-V-Cu-N coatings were deposited by pulsed dc magnetron sputtering with assistance from an anode layer ion source, and the influence of the V/Mo atomic ratio was explored with regard to the microstructure and mechanical properties of the coatings. The findings of this study indicated that the MoVCuN coatings exhibited a solid solution phase of FCC B1-MoVN with a prominent (220) preferred orientation, and the deposition rate was found to decrease from 4.7 to 1.8 nm/min when the V/Mo atomic ratio increased. The average surface roughness of the MoVCuN coatings gradually decreased, and the lowest surface roughness of 6.9 nm was achieved at a V/Mo atomic ratio of 0.31. Due to the enhanced ion bombardment effect, the coatings changed from a coarse columnar to a dense columnar crystal structure, and promoted grain refinement at higher V/Mo atomic ratios, contributing to a gradual improvement in the compressive residual stress, hardness and adhesion strength of the coatings. |
