Ultraviolet-Ozone Treatment: An Effective Method for Fine-Tuning Optical and Electrical Properties of Suspended and Substrate-Supported MoS 2 .

Autor: Sarcan F; School of Physics, Engineering and Technology, University of York, Heslington, York YO10 5DD, UK.; Department of Physics, Faculty of Science, Istanbul University, Vezneciler, Istanbul 34134, Turkey., Armstrong AJ; School of Physics, Engineering and Technology, University of York, Heslington, York YO10 5DD, UK., Bostan YK; Department of Physics, Faculty of Science, Istanbul University, Vezneciler, Istanbul 34134, Turkey.; Institut d'Electronique, Microelectronique & Nanotechnologie IEMN CNRS UMR 8520, Université Polytechnique Hauts de France, 59313 Valenciennes, France., Kus E; Department of Physics, Faculty of Science, Istanbul University, Vezneciler, Istanbul 34134, Turkey., McKenna KP; School of Physics, Engineering and Technology, University of York, Heslington, York YO10 5DD, UK., Erol A; Department of Physics, Faculty of Science, Istanbul University, Vezneciler, Istanbul 34134, Turkey., Wang Y; School of Physics, Engineering and Technology, University of York, Heslington, York YO10 5DD, UK.
Jazyk: angličtina
Zdroj: Nanomaterials (Basel, Switzerland) [Nanomaterials (Basel)] 2023 Nov 27; Vol. 13 (23). Date of Electronic Publication: 2023 Nov 27.
DOI: 10.3390/nano13233034
Abstrakt: Ultraviolet-ozone (UV-O 3 ) treatment is a simple but effective technique for surface cleaning, surface sterilization, doping, and oxidation, and is applicable to a wide range of materials. In this study, we investigated how UV-O 3 treatment affects the optical and electrical properties of molybdenum disulfide (MoS 2 ), with and without the presence of a dielectric substrate. We performed detailed photoluminescence (PL) measurements on 1-7 layers of MoS 2 with up to 8 min of UV-O 3 exposure. Density functional theory (DFT) calculations were carried out to provide insight into oxygen-MoS 2 interaction mechanisms. Our results showed that the influence of UV-O 3 treatment on PL depends on whether the substrate is present, as well as the number of layers. Additionally, 4 min of UV-O 3 treatment was found to be optimal to produce p-type MoS 2 , while maintaining above 80% of the PL intensity and the emission wavelength, compared to pristine flakes (intrinsically n-type). UV-O 3 treatment for more than 6 min not only caused a reduction in the electron density but also deteriorated the hole-dominated transport. It is revealed that the substrate plays a critical role in the manipulation of the electrical and optical properties of MoS 2 , which should be considered in future device fabrication and applications.
Databáze: MEDLINE