Autor: |
Doderer M; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Keller K; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Winiger J; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Baumann M; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Messner A; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Moor D; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Chelladurai D; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Fedoryshyn Y; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Leuthold J; Institute of Electromagnetic Fields (IEF), ETH Zurich, 8092 Zurich, Switzerland., Strait J; Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States., Agrawal A; Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States., Lezec HJ; Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States., Haffner C; Interuniversity Microelectronics Centre (imec), Remisebosweg 1, 3001 Leuven, Belgium. |