Atomic Layer Deposition-A Versatile Toolbox for Designing/Engineering Electrodes for Advanced Supercapacitors.

Autor: Ansari MZ; School of Materials Science and Engineering, Yeungnam University, 280 Daehak-Ro, Gyeongsan, Gyeongbuk, 38541, Republic of Korea., Hussain I; Department of Mechanical Engineering, City University of Hong Kong, 83 Tat Chee Avenue, Kowoon, Hong Kong., Mohapatra D; Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science & Technology (UNIST), 50 UNIST-gil, Ulju-gun, Ulsan, 44919, Republic of Korea., Ansari SA; Department of Physics, College of Science, King Faisal University, P.O. Box 400, Hofuf, Al-Ahsa, 31982, Saudi Arabia., Rahighi R; SKKU Advanced Institute of Nano-Technology (SAINT), Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do, 16419, Republic of Korea., Nandi DK; Plessey Semiconductors Ltd, Tamerton Road Roborough, Plymouth, Devon, PL6 7BQ, UK., Song W; Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon, 34114, Republic of Korea., Kim SH; Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science & Technology (UNIST), 50 UNIST-gil, Ulju-gun, Ulsan, 44919, Republic of Korea.; Department of Materials Science and Engineering, Ulsan National Institute of Science & Technology (UNIST), 50 UNIST-gil, Ulju-gun, Ulsan, 44919, Republic of Korea.
Jazyk: angličtina
Zdroj: Advanced science (Weinheim, Baden-Wurttemberg, Germany) [Adv Sci (Weinh)] 2024 Jan; Vol. 11 (1), pp. e2303055. Date of Electronic Publication: 2023 Nov 08.
DOI: 10.1002/advs.202303055
Abstrakt: Atomic layer deposition (ALD) has become the most widely used thin-film deposition technique in various fields due to its unique advantages, such as self-terminating growth, precise thickness control, and excellent deposition quality. In the energy storage domain, ALD has shown great potential for supercapacitors (SCs) by enabling the construction and surface engineering of novel electrode materials. This review aims to present a comprehensive outlook on the development, achievements, and design of advanced electrodes involving the application of ALD for realizing high-performance SCs to date, as organized in several sections of this paper. Specifically, this review focuses on understanding the influence of ALD parameters on the electrochemical performance and discusses the ALD of nanostructured electrochemically active electrode materials on various templates for SCs. It examines the influence of ALD parameters on electrochemical performance and highlights ALD's role in passivating electrodes and creating 3D nanoarchitectures. The relationship between synthesis procedures and SC properties is analyzed to guide future research in preparing materials for various applications. Finally, it is concluded by suggesting the directions and scope of future research and development to further leverage the unique advantages of ALD for fabricating new materials and harness the unexplored opportunities in the fabrication of advanced-generation SCs.
(© 2023 The Authors. Advanced Science published by Wiley-VCH GmbH.)
Databáze: MEDLINE
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