| Autor: |
Li G; Key Laboratory for Advanced Materials, Institute of Applied Chemistry, East China University of Science and Technology, 130 Meilong Road, Shanghai 200237, China. 3148704620@qq.com., Dong N; Photonic Integrated Circuits Center, Key Laboratory of Materials for High-Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. jwang@siom.ac.cn.; Center of Materials Science and Optoelectronics, University of Chinese Academy of Sciences, Beijing 100049, China., Wang X; Chongqing Key Laboratory of Heterogeneous Materials Mechanics, College of Aerospace Engineering, Chongqing University, Chongqing 400040, China. wxz@cqu.edu.cn., Shen X; Key Laboratory for Advanced Materials, Institute of Applied Chemistry, East China University of Science and Technology, 130 Meilong Road, Shanghai 200237, China. 3148704620@qq.com., Wang J; Photonic Integrated Circuits Center, Key Laboratory of Materials for High-Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. jwang@siom.ac.cn.; Center of Materials Science and Optoelectronics, University of Chinese Academy of Sciences, Beijing 100049, China., Chen Y; Key Laboratory for Advanced Materials, Institute of Applied Chemistry, East China University of Science and Technology, 130 Meilong Road, Shanghai 200237, China. 3148704620@qq.com. |
| Abstrakt: |
An optimized complex multi-component nanomaterial system would help greatly enhance the optical limiting performance and applicability of 2D nanomaterials. By using antimony sulfide-[ S -1-dodecyl- S '-(α,α'-dimethyl-α''-acetic acid)trithiocarbonate] (Sb 2 S 3 -DDAT) as a reversible addition fragmentation chain transfer (RAFT) agent, a highly soluble poly( N -vinylcarbazole)-covalently modified Sb 2 S 3 (Sb 2 S 3 -PVK) was synthesized in situ and embedded into a non-optically active poly(methylmethacrylate) (PMMA) matrix producing a PMMA-based film with good optical quality. In contrast to both the Sb 2 S 3 /PMMA and Sb 2 S 3 :PVK blends/PMMA films, the Sb 2 S 3 -PVK/PMMA film exhibits more superior optical limiting performance. After annealing in N 2 at 200 °C for 30 minutes, the achieved nonlinear absorption coefficient and limiting threshold are changed from 411.79 cm GW -1 and 1.93 J cm -2 at 532 nm and 242.79 cm GW -1 and 4.17 J cm -2 at 1064 nm before annealing to 478.04 cm GW -1 and 1.70 J cm -2 at 532 nm and 520.92 cm GW -1 and 1.40 J cm -2 at 1064 nm after annealing, respectively. These advantages make Sb 2 S 3 -PVK one of the potential promising candidates for a broadband laser protector in both the visible and near-infrared ranges. |
