Extreme ultraviolet metalens by vacuum guiding.

Autor: Ossiander M; John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138, USA., Meretska ML; John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138, USA., Hampel HK; Institute of Experimental Physics, Graz University of Technology, 8010 Graz, Austria., Lim SWD; John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138, USA., Knefz N; Institute of Experimental Physics, Graz University of Technology, 8010 Graz, Austria., Jauk T; Institute of Experimental Physics, Graz University of Technology, 8010 Graz, Austria., Capasso F; John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138, USA., Schultze M; Institute of Experimental Physics, Graz University of Technology, 8010 Graz, Austria.
Jazyk: angličtina
Zdroj: Science (New York, N.Y.) [Science] 2023 Apr 07; Vol. 380 (6640), pp. 59-63. Date of Electronic Publication: 2023 Apr 06.
DOI: 10.1126/science.adg6881
Abstrakt: Extreme ultraviolet (EUV) radiation is a key technology for material science, attosecond metrology, and lithography. Here, we experimentally demonstrate metasurfaces as a superior way to focus EUV light. These devices exploit the fact that holes in a silicon membrane have a considerably larger refractive index than the surrounding material and efficiently vacuum-guide light with a wavelength of ~50 nanometers. This allows the transmission phase at the nanoscale to be controlled by the hole diameter. We fabricated an EUV metalens with a 10-millimeter focal length that supports numerical apertures of up to 0.05 and used it to focus ultrashort EUV light bursts generated by high-harmonic generation down to a 0.7-micrometer waist. Our approach introduces the vast light-shaping possibilities provided by dielectric metasurfaces to a spectral regime that lacks materials for transmissive optics.
Databáze: MEDLINE
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