Ultra-low detection limit chemoresistive NO 2 gas sensor using single transferred MoS 2 flake: an advanced nanofabrication.

Autor: Hong HS; School of Electrical and Electronic Engineering, Hanoi University of Science and Technology (HUST) No. 1 Dai Co Viet Road Hanoi Vietnam hong.hoangsy@hust.edu.vn +84-43-869-6211., Hoang TV; School of Chemical Engineering, Hanoi University of Science and Technology (HUST) No. 1 Dai Co Viet Road Hanoi Vietnam., Huong NT; School of Electrical and Electronic Engineering, Hanoi University of Science and Technology (HUST) No. 1 Dai Co Viet Road Hanoi Vietnam hong.hoangsy@hust.edu.vn +84-43-869-6211., Nam NH; School of Electrical and Electronic Engineering, Hanoi University of Science and Technology (HUST) No. 1 Dai Co Viet Road Hanoi Vietnam hong.hoangsy@hust.edu.vn +84-43-869-6211., Thinh DD; School of Electrical and Electronic Engineering, Hanoi University of Science and Technology (HUST) No. 1 Dai Co Viet Road Hanoi Vietnam hong.hoangsy@hust.edu.vn +84-43-869-6211., Hue NT; School of Electrical and Electronic Engineering, Hanoi University of Science and Technology (HUST) No. 1 Dai Co Viet Road Hanoi Vietnam hong.hoangsy@hust.edu.vn +84-43-869-6211., Thuan ND; School of Electrical and Electronic Engineering, Hanoi University of Science and Technology (HUST) No. 1 Dai Co Viet Road Hanoi Vietnam hong.hoangsy@hust.edu.vn +84-43-869-6211.
Jazyk: angličtina
Zdroj: RSC advances [RSC Adv] 2022 Nov 22; Vol. 12 (51), pp. 33403-33408. Date of Electronic Publication: 2022 Nov 22 (Print Publication: 2022).
DOI: 10.1039/d2ra06228c
Abstrakt: In this work, a method of fabricating a NO 2 nano-sensor working at room temperature with a low detectable concentration limit is proposed. A 2D-MoS 2 flake is isolated by transferring a single MoS 2 flake to SiO 2 /Si substrate, followed by applying an advanced e-beam lithography (EBL) to form a metal contact with Au/Cr electrodes. The resulting chemoresistive nano-sensor using a single MoS 2 flake was applied to detect a very low concentration of NO 2 at the part-per-billion (ppb) level. This result is obtained due to the ability to create microscopic nano-sized MoS 2 gaps using e-beam lithography (300 nm-400 nm). Experimental results also show that the sensor can capture changes in concentration and send the information out extremely quickly. The response and recovery time of the sensor also reached the lowest point of 50 and 75 ms, outperforming other sensors with a similar concentration working range.
Competing Interests: There are no conflicts to declare.
(This journal is © The Royal Society of Chemistry.)
Databáze: MEDLINE
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