Versatile Surface Patterning with Low Molecular Weight Photoswitches.

Autor: Meteling HJ; Center for Soft Nanoscience and Organic Chemistry Institute, Westfälische Wilhelms-Universität Münster, Busso-Peus-Str. 10, 48149, Münster, Germany., Bosse F; Center for Soft Nanoscience and Organic Chemistry Institute, Westfälische Wilhelms-Universität Münster, Busso-Peus-Str. 10, 48149, Münster, Germany., Schlichter L; Center for Soft Nanoscience and Organic Chemistry Institute, Westfälische Wilhelms-Universität Münster, Busso-Peus-Str. 10, 48149, Münster, Germany., Tyler BJ; Center for Soft Nanoscience and Physics Institute, Westfälische Wilhelms-Universität Münster, Busso-Peus-Str. 10, 48149, Münster, Germany., Arlinghaus HF; Center for Soft Nanoscience and Physics Institute, Westfälische Wilhelms-Universität Münster, Busso-Peus-Str. 10, 48149, Münster, Germany., Ravoo BJ; Center for Soft Nanoscience and Organic Chemistry Institute, Westfälische Wilhelms-Universität Münster, Busso-Peus-Str. 10, 48149, Münster, Germany.
Jazyk: angličtina
Zdroj: Small (Weinheim an der Bergstrasse, Germany) [Small] 2022 Sep; Vol. 18 (37), pp. e2203245. Date of Electronic Publication: 2022 Aug 15.
DOI: 10.1002/smll.202203245
Abstrakt: Surface patterning of functional materials is a key technology in various fields such as microelectronics, optics, and photonics. In micro- and nanofabrication, polymers are frequently employed either as photoreactive or thermoresponsive resists that enable further fabrication steps, or as functional adlayers in electronic and optical devices. In this article, a method is presented for imprint lithography using low molecular weight arylazoisoxazoles photoswitches instead of polymer resists. These photoswitches exhibit a rapid and reversible solid-to-liquid phase transition upon photo-isomerization at room temperature, making them highly suitable for reversible surface functionalization at ambient conditions. Beyond photo-induced imprint lithography with multiple write-and-erase cycles, prospective applications as patterned matrix for nanoparticles and etch resist on gold surfaces are demonstrated.
(© 2022 The Authors. Small published by Wiley-VCH GmbH.)
Databáze: MEDLINE
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