Charged Particle-Induced Surface Reactions of Organometallic Complexes as a Guide to Precursor Design for Electron- and Ion-Induced Deposition of Nanostructures.

Autor:	Yu JC; Department of Chemistry, University of Florida, Gainesville, Florida 32611-7200, United States., Abdel-Rahman MK; Department of Chemistry, Johns Hopkins University, Baltimore, Maryland 21218-2685, United States., Fairbrother DH; Department of Chemistry, Johns Hopkins University, Baltimore, Maryland 21218-2685, United States., McElwee-White L; Department of Chemistry, University of Florida, Gainesville, Florida 32611-7200, United States.
Jazyk:	angličtina
Zdroj:	ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2021 Oct 20; Vol. 13 (41), pp. 48333-48348. Date of Electronic Publication: 2021 Oct 11.
DOI:	10.1021/acsami.1c12327
Abstrakt:	Focused electron beam-induced deposition (FEBID) and focused ion beam-induced deposition (FIBID) are direct-write fabrication techniques that use focused beams of charged particles (electrons or ions) to create 3D metal-containing nanostructures by decomposing organometallic precursors onto substrates in a low-pressure environment. For many applications, it is important to minimize contamination of these nanostructures by impurities from incomplete ligand dissociation and desorption. This spotlight on applications describes the use of ultra high vacuum surface science studies to obtain mechanistic information on electron- and ion-induced processes in organometallic precursor candidates. The results are used for the mechanism-based design of custom precursors for FEBID and FIBID.
Databáze:	MEDLINE
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