| Autor: |
Lutsenko SV, Kozhaev MA, Borovkova OV, Kalish AN, Temiryazev AG, Dagesyan SA, Berzhansky VN, Shaposhnikov AN, Kuzmichev AN, Belotelov VI |
| Jazyk: |
angličtina |
| Zdroj: |
Optics letters [Opt Lett] 2021 Sep 01; Vol. 46 (17), pp. 4148-4151. |
| DOI: |
10.1364/OL.433309 |
| Abstrakt: |
We propose a novel, to the best of our knowledge, technique for magnetoplasmonic nanostructures fabrication based on the pulse force nanolithography method. It allows one to create the high-quality magnetoplasmonic nanostructures that have lower total losses than the gratings made by the electron-beam lithography. The method provides control of the surface plasmon polaritons excitation efficiency by varying the grating parameters such as the scratching depth or the number of scratches in a single period. The quality of the plasmonic gratings was estimated by means of the transverse magneto-optical Kerr effect that is extremely sensitive to the finesse of a plasmonic structure. |
| Databáze: |
MEDLINE |
| Externí odkaz: |
|
