Autor: |
Li G; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Zhang X; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States.; State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu, Sichuan 610054, P.R. China., Jones LO; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Alzola JM; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Mukherjee S; Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States., Feng LW; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Zhu W; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States.; Tianjin Key Laboratory of Molecular Optoelectronic Sciences (TJ-MOS), Department of Chemistry, School of Science, Tianjin University, Tianjin 300072, China., Stern CL; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Huang W; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Yu J; State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China (UESTC), Chengdu, Sichuan 610054, P.R. China., Sangwan VK; Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States., DeLongchamp DM; Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, United States., Kohlstedt KL; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Wasielewski MR; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Hersam MC; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States.; Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States., Schatz GC; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States., Facchetti A; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States.; Flexterra Corporation, 8025 Lamon Avenue, Skokie, Illinois 60077, United States., Marks TJ; Department of Chemistry, the Center for Light Energy Activated Redox Processes (LEAP), and the Materials Research Center (MRC), Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, United States.; Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States. |