Autor: |
Kampouri S; Laboratory for Molecular Simulations, Institute of Chemical Sciences and Engineering, École Polytechnique Fedérale de Lausanne (EPFL Valais), Rue de l'Industrie 17, Sion 1951, Switzerland., Ebrahim FM; Laboratory for Molecular Simulations, Institute of Chemical Sciences and Engineering, École Polytechnique Fedérale de Lausanne (EPFL Valais), Rue de l'Industrie 17, Sion 1951, Switzerland., Fumanal M; Laboratory for Molecular Simulations, Institute of Chemical Sciences and Engineering, École Polytechnique Fedérale de Lausanne (EPFL Valais), Rue de l'Industrie 17, Sion 1951, Switzerland., Nord M; Department of Chemistry, Oregon State University, Gilbert Hall 153, Corvallis, Oregon 97331-4003, United States., Schouwink PA; Laboratory for Molecular Simulations, Institute of Chemical Sciences and Engineering, École Polytechnique Fedérale de Lausanne (EPFL Valais), Rue de l'Industrie 17, Sion 1951, Switzerland., Elzein R; School of Chemical, Biological and Environmental Engineering, Oregon State University, Corvallis, Oregon 97331, United States., Addou R; School of Chemical, Biological and Environmental Engineering, Oregon State University, Corvallis, Oregon 97331, United States., Herman GS; School of Chemical, Biological and Environmental Engineering, Oregon State University, Corvallis, Oregon 97331, United States., Smit B; Laboratory for Molecular Simulations, Institute of Chemical Sciences and Engineering, École Polytechnique Fedérale de Lausanne (EPFL Valais), Rue de l'Industrie 17, Sion 1951, Switzerland., Ireland CP; Laboratory for Molecular Simulations, Institute of Chemical Sciences and Engineering, École Polytechnique Fedérale de Lausanne (EPFL Valais), Rue de l'Industrie 17, Sion 1951, Switzerland., Stylianou KC; Laboratory for Molecular Simulations, Institute of Chemical Sciences and Engineering, École Polytechnique Fedérale de Lausanne (EPFL Valais), Rue de l'Industrie 17, Sion 1951, Switzerland.; Department of Chemistry, Oregon State University, Gilbert Hall 153, Corvallis, Oregon 97331-4003, United States. |