Solar photon-Fenton process eliminates free plasmid DNA harboring antimicrobial resistance genes from wastewater.

Autor: Vilela PB; Research Group on the Environmental Application of Advanced Oxidation Processes (GruPOA), Universidade Federal de Minas Gerais, Engineering School - Sanitary and Environmental Engineering Department, Av. Antônio Carlos 6627, 31270-901, Pampulha, Belo Horizonte, Brazil., Martins AS; Research Group on the Environmental Application of Advanced Oxidation Processes (GruPOA), Universidade Federal de Minas Gerais, Engineering School - Sanitary and Environmental Engineering Department, Av. Antônio Carlos 6627, 31270-901, Pampulha, Belo Horizonte, Brazil., Starling MCVM; Research Group on the Environmental Application of Advanced Oxidation Processes (GruPOA), Universidade Federal de Minas Gerais, Engineering School - Sanitary and Environmental Engineering Department, Av. Antônio Carlos 6627, 31270-901, Pampulha, Belo Horizonte, Brazil., de Souza FAR; Research Group on the Environmental Application of Advanced Oxidation Processes (GruPOA), Universidade Federal de Minas Gerais, Engineering School - Sanitary and Environmental Engineering Department, Av. Antônio Carlos 6627, 31270-901, Pampulha, Belo Horizonte, Brazil., Pires GFF; Research Group on the Environmental Application of Advanced Oxidation Processes (GruPOA), Universidade Federal de Minas Gerais, Engineering School - Sanitary and Environmental Engineering Department, Av. Antônio Carlos 6627, 31270-901, Pampulha, Belo Horizonte, Brazil., Aguilar AP; Universidade Federal de Viçosa, Department of Biochemistry and Molecular Biology, Av. Peter Henry Rolfs, Viçosa, Brazil., Pinto MEA; Universidade Federal de Viçosa, Department of Biochemistry and Molecular Biology, Av. Peter Henry Rolfs, Viçosa, Brazil., Mendes TAO; Universidade Federal de Viçosa, Department of Biochemistry and Molecular Biology, Av. Peter Henry Rolfs, Viçosa, Brazil., de Amorim CC; Research Group on the Environmental Application of Advanced Oxidation Processes (GruPOA), Universidade Federal de Minas Gerais, Engineering School - Sanitary and Environmental Engineering Department, Av. Antônio Carlos 6627, 31270-901, Pampulha, Belo Horizonte, Brazil. Electronic address: camila@desa.ufmg.br.
Jazyk: angličtina
Zdroj: Journal of environmental management [J Environ Manage] 2021 May 01; Vol. 285, pp. 112204. Date of Electronic Publication: 2021 Feb 19.
DOI: 10.1016/j.jenvman.2021.112204
Abstrakt: This work aimed to assess the elimination and inactivation of resistance-conferring plasmids (RCPs) present in suspension in secondary wastewater by solar photo-Fenton as these are important vectors for the dissemination of antimicrobial resistance. Experiments were performed in synthetic secondary wastewater (SWW) and municipal wastewater treatment plant effluent (MWWTPE). Solar photo-Fenton (50 mg L -1 of H 2 O 2 and 30 mg L -1 of Fe 2+ ) was carried out for 60 min at neutral pH by applying the intermittent iron addition strategy. The removal of RCPs was assessed by Real-Time Polymerase Chain Reaction (qPCR). The transformation of competent non-resistant E. coli was used to evaluate the inactivation of target RCPs harboring antibiotic resistance genes (ARGs) to ampicillin (pSB1A2) or kanamycin (pSB1K3) after treatment and controls. Solar photo-Fenton completely removed RCPs initially present in both matrixes (SWW and MWWTPE), showing enhanced performance compared to the dark Fenton process. Both RCPs were inactivated after 30 min of solar photo-Fenton treatment, while 60 min were necessary to achieve the same effect for the dark Fenton reaction under similar conditions. These results indicate the potential of solar photo-Fenton to improve wastewater quality and reduce the spread of antimicrobial resistance in the environment by hampering the discharge of cell-free RCPs present in suspension in MWWTP onto environmental waters.
(Copyright © 2021 The Authors. Published by Elsevier Ltd.. All rights reserved.)
Databáze: MEDLINE
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