Atomic Layer Deposition of Cobalt Phosphide for Efficient Water Splitting.

Autor: Zhang H; Institute of Physics, Martin Luther University Halle-Wittenberg, Heinrich-Damerow-Strasse 4, 06120, Halle, Saale, Germany., Hagen DJ; Max Planck Institute of Microstructure Physics, Weinberg 2, 06120, Halle, Saale, Germany., Li X; State Key Laboratory for Modification of Chemical Fibers and Polymer Materials & College of Materials Science and Engineering, Donghua University, Shanghai, 201620, China., Graff A; Fraunhofer Institute for Microstructure of Materials and Systems, Walter-Hülse-Strasse 1, Halle, Saale, Germany., Heyroth F; Interdisciplinary center of materials science, Martin Luther University Halle-Wittenberg, Heinrich-Damerow-Strasse 4, 06120, Halle, Saale, Germany., Fuhrmann B; Interdisciplinary center of materials science, Martin Luther University Halle-Wittenberg, Heinrich-Damerow-Strasse 4, 06120, Halle, Saale, Germany., Kostanovskiy I; Max Planck Institute of Microstructure Physics, Weinberg 2, 06120, Halle, Saale, Germany., Schweizer SL; Institute of Physics, Martin Luther University Halle-Wittenberg, Heinrich-Damerow-Strasse 4, 06120, Halle, Saale, Germany., Caddeo F; Centre for Innovation Competence SiLi-nano®, Martin Luther University Halle-Wittenberg, Karl-Freiherr-von-Fritsch-Strasse 3, 06120, Halle, Saale, Germany., Maijenburg AW; Centre for Innovation Competence SiLi-nano®, Martin Luther University Halle-Wittenberg, Karl-Freiherr-von-Fritsch-Strasse 3, 06120, Halle, Saale, Germany., Parkin S; Max Planck Institute of Microstructure Physics, Weinberg 2, 06120, Halle, Saale, Germany., Wehrspohn RB; Institute of Physics, Martin Luther University Halle-Wittenberg, Heinrich-Damerow-Strasse 4, 06120, Halle, Saale, Germany.; Fraunhofer-Gesellschaft, Hansastrasse 27 c, 80686, Munich, Germany.
Jazyk: angličtina
Zdroj: Angewandte Chemie (International ed. in English) [Angew Chem Int Ed Engl] 2020 Sep 21; Vol. 59 (39), pp. 17172-17176. Date of Electronic Publication: 2020 Aug 07.
DOI: 10.1002/anie.202002280
Abstrakt: Transition-metal phosphides (TMP) prepared by atomic layer deposition (ALD) are reported for the first time. Ultrathin Co-P films were deposited by using PH 3 plasma as the phosphorus source and an extra H 2 plasma step to remove excess P in the growing films. The optimized ALD process proceeded by self-limited layer-by-layer growth, and the deposited Co-P films were highly pure and smooth. The Co-P films deposited via ALD exhibited better electrochemical and photoelectrochemical hydrogen evolution reaction (HER) activities than similar Co-P films prepared by the traditional post-phosphorization method. Moreover, the deposition of ultrathin Co-P films on periodic trenches was demonstrated, which highlights the broad and promising potential application of this ALD process for a conformal coating of TMP films on complex three-dimensional (3D) architectures.
(© 2020 The Authors. Published by Wiley-VCH GmbH.)
Databáze: MEDLINE
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