| Autor: |
Tanabe I; Graduate School of Engineering Science, Osaka University, Machikaneyama 1-3, Toyonaka, Osaka, 6508531, Japan. itanabe@chem.es.osaka-u.ac.jp., Tanaka YY; Institute of Industrial Science, the University of Tokyo, 4-6-1 Komaba, Meguro, Tokyo, 1538505, Japan. yoshito@iis.u-tokyo.ac.jp., Watari K; School of Science and Technology, Kwansei Gakuin University, Gakuen 2-1, Sanda, Hyogo, 6691337, Japan., Inami W; Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Shizuoka, 4328561, Japan., Kawata Y; Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Shizuoka, 4328561, Japan., Ozaki Y; School of Science and Technology, Kwansei Gakuin University, Gakuen 2-1, Sanda, Hyogo, 6691337, Japan. |
| Abstrakt: |
In this study, surface plasmon resonance (SPR) wavelength shifts due to molecular electronic absorptions in the far-ultraviolet (FUV, < 200 nm) and deep-ultraviolet (DUV, < 300 nm) regions were investigated by attenuated total reflectance (ATR) spectroscopy. Due to the strong absorption in the DUV region, N,N-dimethylformamide (DMF) significantly increased the SPR wavelength shift of Al film. On the other hand, no such shift enhancement was observed in the visible region for Au film because DMF does not have absorbance compared to non-absorbing materials such as water and alcohols. The enhanced SPR wavelength shift, caused by the overlap between SPR and molecular resonance wavelengths in FUV-DUV region, is expected to result in high sensitivity for resonant materials. |
