Autor: |
Zinovieva AF; Rzhanov Institute of Semiconductor Physics, SB RAS, 630090, Novosibirsk, Russia.; Novosibirsk State University, 630090, Novosibirsk, Russia., Zinovyev VA; Rzhanov Institute of Semiconductor Physics, SB RAS, 630090, Novosibirsk, Russia. zinoviev@isp.nsc.ru., Nenashev AV; Rzhanov Institute of Semiconductor Physics, SB RAS, 630090, Novosibirsk, Russia.; Novosibirsk State University, 630090, Novosibirsk, Russia., Teys SA; Rzhanov Institute of Semiconductor Physics, SB RAS, 630090, Novosibirsk, Russia., Dvurechenskii AV; Rzhanov Institute of Semiconductor Physics, SB RAS, 630090, Novosibirsk, Russia.; Novosibirsk State University, 630090, Novosibirsk, Russia., Borodavchenko OM; Scientific-Practical Material Research Centre of the National Academy of Science of Belarus, P. Brovki, 220072, Minsk, Belarus., Zhivulko VD; Scientific-Practical Material Research Centre of the National Academy of Science of Belarus, P. Brovki, 220072, Minsk, Belarus., Mudryi AV; Scientific-Practical Material Research Centre of the National Academy of Science of Belarus, P. Brovki, 220072, Minsk, Belarus. |