| Autor: |
Le-The H; BIOS Lab-on-a-Chip Group, MESA+ Institute, Max Planck Center for Complex Fluid Dynamics, University of Twente, 7522 NB Enschede, The Netherlands. h.lethe@utwente.nl., Lozeman JJA; BIOS Lab-on-a-Chip Group, MESA+ Institute, Max Planck Center for Complex Fluid Dynamics, University of Twente, 7522 NB Enschede, The Netherlands. h.lethe@utwente.nl., Lafuente M; Nanoscience Institute of Aragon, Department of Chemical & Environmental Engineering, University of Zaragoza, 50018 Zaragoza, Spain., Muñoz P; Optical Sciences Group, MESA+ Institute, University of Twente, 7522 NB Enschede, The Netherlands., Bomer JG; BIOS Lab-on-a-Chip Group, MESA+ Institute, Max Planck Center for Complex Fluid Dynamics, University of Twente, 7522 NB Enschede, The Netherlands. h.lethe@utwente.nl., Duy-Tong H; Faculty of Engineering, Vietnamese German University, Thu Dau Mot City, Binh Duong Province, Vietnam., Berenschot E; Mesoscale Chemical Systems Group, MESA+ Institute, University of Twente, 7522 NB Enschede, The Netherlands., van den Berg A; BIOS Lab-on-a-Chip Group, MESA+ Institute, Max Planck Center for Complex Fluid Dynamics, University of Twente, 7522 NB Enschede, The Netherlands. h.lethe@utwente.nl., Tas NR; Mesoscale Chemical Systems Group, MESA+ Institute, University of Twente, 7522 NB Enschede, The Netherlands., Odijk M; BIOS Lab-on-a-Chip Group, MESA+ Institute, Max Planck Center for Complex Fluid Dynamics, University of Twente, 7522 NB Enschede, The Netherlands. h.lethe@utwente.nl., Eijkel JCT; BIOS Lab-on-a-Chip Group, MESA+ Institute, Max Planck Center for Complex Fluid Dynamics, University of Twente, 7522 NB Enschede, The Netherlands. h.lethe@utwente.nl. |
| Abstrakt: |
We report a robust and high-yield fabrication method for wafer-scale patterning of high-quality arrays of dense gold nanogaps, combining displacement Talbot lithography based shrink-etching with dry etching, wet etching, and thin film deposition techniques. By using the self-sharpening of <111>-oriented silicon crystal planes during the wet etching process, silicon structures with extremely smooth nanogaps are obtained. Subsequent conformal deposition of a silicon nitride layer and a gold layer results in dense arrays of narrow gold nanogaps. Using this method, we successfully fabricate high-quality Au nanogaps down to 10 nm over full wafer areas. Moreover, the gap spacing can be tuned by changing the thickness of deposited Au layers. Since the roughness of the template is minimized by the crystallographic etching of silicon, the roughness of the gold nanogaps depends almost exclusively on the roughness of the sputtered gold layers. Additionally, our fabricated Au nanogaps show a significant enhancement of surface-enhanced Raman scattering (SERS) signals of benzenethiol molecules chemisorbed on the structure surface, at an average enhancement factor up to 1.5 × 10 6 . |
