Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS 2 Films.

Autor: Mattinen M; Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014, Finland., King PJ; Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014, Finland., Khriachtchev L; Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014, Finland., Meinander K; Division of Materials Physics, Department of Physics, University of Helsinki, P.O. Box 43, FI-00014, Finland., Gibbon JT; Stephenson Institute for Renewable Energy and Department of Physics, University of Liverpool, Liverpool, L69 7ZF, UK., Dhanak VR; Stephenson Institute for Renewable Energy and Department of Physics, University of Liverpool, Liverpool, L69 7ZF, UK., Räisänen J; Division of Materials Physics, Department of Physics, University of Helsinki, P.O. Box 43, FI-00014, Finland., Ritala M; Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014, Finland., Leskelä M; Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014, Finland.
Jazyk: angličtina
Zdroj: Small (Weinheim an der Bergstrasse, Germany) [Small] 2018 May; Vol. 14 (21), pp. e1800547. Date of Electronic Publication: 2018 Apr 19.
DOI: 10.1002/smll.201800547
Abstrakt: Semiconducting 2D materials, such as SnS 2 , hold immense potential for many applications ranging from electronics to catalysis. However, deposition of few-layer SnS 2 films has remained a great challenge. Herein, continuous wafer-scale 2D SnS 2 films with accurately controlled thickness (2 to 10 monolayers) are realized by combining a new atomic layer deposition process with low-temperature (250 °C) postdeposition annealing. Uniform coating of large-area and 3D substrates is demonstrated owing to the unique self-limiting growth mechanism of atomic layer deposition. Detailed characterization confirms the 1T-type crystal structure and composition, smoothness, and continuity of the SnS 2 films. A two-stage deposition process is also introduced to improve the texture of the films. Successful deposition of continuous, high-quality SnS 2 films at low temperatures constitutes a crucial step toward various applications of 2D semiconductors.
(© 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.)
Databáze: MEDLINE
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