Autor: |
Joyce LA; Department of Process Research & Development , Merck & Co., Inc. , Rahway , NJ 07065 , USA . Email: leo.joyce@merck.com ; Email: christopher.nawrat@merck.com., Nawrat CC; Department of Process Research & Development , Merck & Co., Inc. , Rahway , NJ 07065 , USA . Email: leo.joyce@merck.com ; Email: christopher.nawrat@merck.com., Sherer EC; Department of Modeling and Informatics , Merck & Co., Inc. , Rahway , NJ 07065 , USA., Biba M; Department of Process Research & Development , Merck & Co., Inc. , Rahway , NJ 07065 , USA . Email: leo.joyce@merck.com ; Email: christopher.nawrat@merck.com., Brunskill A; Department of Process Research & Development , Merck & Co., Inc. , Rahway , NJ 07065 , USA . Email: leo.joyce@merck.com ; Email: christopher.nawrat@merck.com., Martin GE; Department of Process Research & Development , Merck & Co., Inc. , Rahway , NJ 07065 , USA . Email: leo.joyce@merck.com ; Email: christopher.nawrat@merck.com., Cohen RD; Department of Process Research & Development , Merck & Co., Inc. , Rahway , NJ 07065 , USA . Email: leo.joyce@merck.com ; Email: christopher.nawrat@merck.com., Davies IW; Department of Process Research & Development , Merck & Co., Inc. , Rahway , NJ 07065 , USA . Email: leo.joyce@merck.com ; Email: christopher.nawrat@merck.com. |