Gene Expression on DNA Biochips Patterned with Strand-Displacement Lithography.

Autor: Pardatscher G; Physics-Department and ZNN, Technische Universität München, Am Coulombwall 4a, 85748, Garching, Germany., Schwarz-Schilling M; Physics-Department and ZNN, Technische Universität München, Am Coulombwall 4a, 85748, Garching, Germany., Daube SS; Department of Chemical and Biological Physics, The Weizmann Institute of Science, Rehovot, 76100, Israel., Bar-Ziv RH; Department of Chemical and Biological Physics, The Weizmann Institute of Science, Rehovot, 76100, Israel., Simmel FC; Physics-Department and ZNN, Technische Universität München, Am Coulombwall 4a, 85748, Garching, Germany.
Jazyk: angličtina
Zdroj: Angewandte Chemie (International ed. in English) [Angew Chem Int Ed Engl] 2018 Apr 16; Vol. 57 (17), pp. 4783-4786. Date of Electronic Publication: 2018 Mar 15.
DOI: 10.1002/anie.201800281
Abstrakt: Lithographic patterning of DNA molecules enables spatial organization of cell-free genetic circuits under well-controlled experimental conditions. Here, we present a biocompatible, DNA-based resist termed "Bephore", which is based on commercially available components and can be patterned by both photo- and electron-beam lithography. The patterning mechanism is based on cleavage of a chemically modified DNA hairpin by ultraviolet light or electrons, and a subsequent strand-displacement reaction. All steps are performed in aqueous solution and do not require chemical development of the resist, which makes the lithographic process robust and biocompatible. Bephore is well suited for multistep lithographic processes, enabling the immobilization of different types of DNA molecules with micrometer precision. As an application, we demonstrate compartmentalized, on-chip gene expression from three sequentially immobilized DNA templates, leading to three spatially resolved protein-expression gradients.
(© 2018 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.)
Databáze: MEDLINE
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