Nanopatterning of GeTe phase change films via heated-probe lithography.

Autor: Podpirka A; U.S. Naval Research Laboratory, Washington, DC 20375, USA. laura.ruppalt@nrl.navy.mil., Lee WK, Ziegler JI, Brintlinger TH, Felts JR, Simpkins BS, Bassim ND, Laracuente AR, Sheehan PE, Ruppalt LB
Jazyk: angličtina
Zdroj: Nanoscale [Nanoscale] 2017 Jun 29; Vol. 9 (25), pp. 8815-8824.
DOI: 10.1039/c7nr01482a
Abstrakt: The crystallization of amorphous germanium telluride (GeTe) thin films is controlled with nanoscale resolution using the heat from a thermal AFM probe. The dramatic differences between the amorphous and crystalline GeTe phases yield embedded nanoscale features with strong topographic, electronic, and optical contrast. The flexibility of scanning probe lithography enables the width and depth of the features, as well as the extent of their crystallization, to be controlled by varying probe temperature and write speed. Together, these technologies suggest a new approach to nanoelectronic and opto-electronic device fabrication.
Databáze: MEDLINE