Atomic layer deposition of nickel-cobalt spinel thin films.

Autor: Hagen DJ; Department of Chemistry and Materials Science, Aalto University, Espoo, Finland. maarit.karppinen@aalto.fi., Tripathi TS; Department of Chemistry and Materials Science, Aalto University, Espoo, Finland. maarit.karppinen@aalto.fi., Karppinen M; Department of Chemistry and Materials Science, Aalto University, Espoo, Finland. maarit.karppinen@aalto.fi.
Jazyk: angličtina
Zdroj: Dalton transactions (Cambridge, England : 2003) [Dalton Trans] 2017 Apr 05; Vol. 46 (14), pp. 4796-4805.
DOI: 10.1039/c7dt00512a
Abstrakt: We report the atomic layer deposition (ALD) of high-quality crystalline thin films of the spinel-oxide system (Co 1-x Ni x ) 3 O 4 . These spinel oxides are ferrimagnetic p-type semiconductors, and promising material candidates for several applications ranging from photovoltaics and spintronics to thermoelectrics. The spinel phase is obtained for Ni contents exceeding the x = 0.33 limit for bulk samples. It is observed that the electrical resistivity decreases continuously with x while the magnetic moment increases up to x = 0.5. This is in contrast to bulk samples where a decrease of resistivity is not observed for x > 0.33 due to the formation of a rock-salt phase. From UV-VIS-NIR absorption measurements, a change from distinct absorption edges for the parent oxide Co 3 O 4 to a continuous absorption band ranging deep into the near infrared for 0 < x ≤ 0.5 was observed. The conformal deposition of dense films on high-aspect-ratio patterns is demonstrated.
Databáze: MEDLINE
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