Stranski-Krastanov and Volmer-Weber CVD Growth Regimes To Control the Stacking Order in Bilayer Graphene.

Autor: Ta HQ; College of Physics, Optoelectronics and Energy & Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University , Suzhou 215006, China.; Centre of Polymer and Carbon Materials, Polish Academy of Sciences , M. Curie-Sklodowskiej 34, Zabrze 41-819, Poland.; Department of Energy Science, Department of Physics, Sungkyunkwan University , Suwon 16419, Republic of Korea., Perello DJ; Center for Integrated Nanostructure Physics, Institute for Basic Science, Sungkyunkwan University , Suwon 16419, Republic of Korea., Duong DL; Center for Integrated Nanostructure Physics, Institute for Basic Science, Sungkyunkwan University , Suwon 16419, Republic of Korea., Han GH; Center for Integrated Nanostructure Physics, Institute for Basic Science, Sungkyunkwan University , Suwon 16419, Republic of Korea., Gorantla S; Department of Physics, University of Oslo , Blindern, P.O. Box 1048, 0316 Oslo, Norway., Nguyen VL; Center for Integrated Nanostructure Physics, Institute for Basic Science, Sungkyunkwan University , Suwon 16419, Republic of Korea., Bachmatiuk A; Centre of Polymer and Carbon Materials, Polish Academy of Sciences , M. Curie-Sklodowskiej 34, Zabrze 41-819, Poland.; IFW Dresden, P.O. Box 270116, D-01171 Dresden, Germany., Rotkin SV; Department of Physics and Center for Advanced Materials and Nanotechnology, Lehigh University , Bethlehem, Pennsylvania 18015, United States., Lee YH; Center for Integrated Nanostructure Physics, Institute for Basic Science, Sungkyunkwan University , Suwon 16419, Republic of Korea.; Department of Energy Science, Department of Physics, Sungkyunkwan University , Suwon 16419, Republic of Korea., Rümmeli MH; College of Physics, Optoelectronics and Energy & Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University , Suzhou 215006, China.; Centre of Polymer and Carbon Materials, Polish Academy of Sciences , M. Curie-Sklodowskiej 34, Zabrze 41-819, Poland.; IFW Dresden, P.O. Box 270116, D-01171 Dresden, Germany.
Jazyk: angličtina
Zdroj: Nano letters [Nano Lett] 2016 Oct 12; Vol. 16 (10), pp. 6403-6410. Date of Electronic Publication: 2016 Oct 03.
DOI: 10.1021/acs.nanolett.6b02826
Abstrakt: Aside from unusual properties of monolayer graphene, bilayer has been shown to have even more interesting physics, in particular allowing bandgap opening with dual gating for proper interlayer symmetry. Such properties, promising for device applications, ignited significant interest in understanding and controlling the growth of bilayer graphene. Here we systematically investigate a broad set of flow rates and relative gas ratio of CH 4 to H 2 in atmospheric pressure chemical vapor deposition of multilayered graphene. Two very different growth windows are identified. For relatively high CH 4 to H 2 ratios, graphene growth is relatively rapid with an initial first full layer forming in seconds upon which new graphene flakes nucleate then grow on top of the first layer. The stacking of these flakes versus the initial graphene layer is mostly turbostratic. This growth mode can be likened to Stranski-Krastanov growth. With relatively low CH 4 to H 2 ratios, growth rates are reduced due to a lower carbon supply rate. In addition bi-, tri-, and few-layer flakes form directly over the Cu substrate as individual islands. Etching studies show that in this growth mode subsequent layers form beneath the first layer presumably through carbon radical intercalation. This growth mode is similar to that found with Volmer-Weber growth and was shown to produce highly oriented AB-stacked materials. These systematic studies provide new insight into bilayer graphene formation and define the synthetic range where gapped bilayer graphene can be reliably produced.
Databáze: MEDLINE
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