Surface Relief Changes in Cholesteric Cyclosiloxane Oligomer Films at Different Temperatures.
| Autor: | Sinitsyna OV; Faculty of Chemistry, Lomonosov Moscow State University , Leninskie gory, Moscow, 119991 Russia., Bobrovsky AY; Faculty of Chemistry, Lomonosov Moscow State University , Leninskie gory, Moscow, 119991 Russia., Meshkov GB; Faculty of Physics, Lomonosov Moscow State University , Leninskie gory, Moscow, 119991 Russia., Yaminsky IV; Faculty of Chemistry, Lomonosov Moscow State University , Leninskie gory, Moscow, 119991 Russia.; Faculty of Physics, Lomonosov Moscow State University , Leninskie gory, Moscow, 119991 Russia., Shibaev VP; Faculty of Chemistry, Lomonosov Moscow State University , Leninskie gory, Moscow, 119991 Russia. |
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| Jazyk: | angličtina |
| Zdroj: | The journal of physical chemistry. B [J Phys Chem B] 2015 Oct 01; Vol. 119 (39), pp. 12708-13. Date of Electronic Publication: 2015 Sep 22. |
| DOI: | 10.1021/acs.jpcb.5b06643 |
| Abstrakt: | The development of new approaches for the surface topography control is an important topic as the relief significantly affects physical and chemical properties of surfaces. We studied cholesteric cyclosiloxane oligomeric films on which surface focal conic domains with double-helix pattern were observed by means of AFM. In situ investigation of the dependence of the films topography on temperature showed that the surface relief formation can be effectively managed by varying conditions of thermal treatment. Obtained structures can be frozen by cooling the films below glass-transition temperature. |
| Databáze: | MEDLINE |
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