| Autor: |
Hartman YM; Institute of Microelectronics Technologies and High Purity Materials, Russian Academy of Sciences, 142432 Chernogolovka, Moscow, Russia., Yunkin VA, Snigirev AA |
| Jazyk: |
angličtina |
| Zdroj: |
Journal of X-ray science and technology [J Xray Sci Technol] 1996 Jan 01; Vol. 6 (3), pp. 249-60. |
| DOI: |
10.3233/XST-1996-6303 |
| Abstrakt: |
The effects appearing in a crystal microstructuring by reactive ion etching on diffraction properties of Bragg-Fresnel lenses were studied. Possible deviations of the real zone structures from ideal ones were considered. The influence of the Fresnel zone displacements due to sidewall undercutting effects and due to a mask erosion was analyzed. Technological tolerances for a different zone profile shape were defined. |
| Databáze: |
MEDLINE |
| Externí odkaz: |
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