Epitaxial Nd-doped α-(Al(1-x)Ga(x))2O3 films on sapphire for solid-state waveguide lasers.

Autor: Kumaran R; Advanced Materials and Process Engineering Laboratory, University of British Columbia, Vancouver, British Columbia V6T 1Z4, Canada. raveen@phas.ubc.ca, Tiedje T, Webster SE, Penson S, Li W
Jazyk: angličtina
Zdroj: Optics letters [Opt Lett] 2010 Nov 15; Vol. 35 (22), pp. 3793-5.
DOI: 10.1364/OL.35.003793
Abstrakt: Single-crystal aluminum-gallium oxide films have been grown by molecular beam epitaxy in the corundum phase. Films of the (Al(1-x)Ga(x))(2)O(3) alloys doped with neodymium have favorable properties for solid-state waveguide lasers, including a high-thermal-conductivity sapphire substrate and a dominant emission peak in the 1090-1096 nm wavelength range. The peak position is linearly correlated to the unit cell volume, which is dependent on film composition and stress. Varying the Ga-Al alloy composition during growth will enable the fabrication of graded-index layers for tunable lasing wavelengths and low scattering losses at the interfaces.
Databáze: MEDLINE